Light-induced creation of metastable defects in hydrogenated amorphous silicon carbide
Author:
Affiliation:
1. a Dipartimento di Fisica, Università di Catania and Istituto Nazionale per la Fisica della Materia , UdR Catania, Corso Italia 57, 1-95129 , Catania , Italy
2. b E-mail:
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642810108225456
Reference12 articles.
1. Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
2. Ion-beam processing of hydrogenated amorphous silicon carbide grown by plasma-enhanced chemical vapour deposition
3. Defect relaxation in amorphous silicon: Stretched exponentials, the Meyer-Neldel rule, and the Staebler-Wronski effect
4. Hydrogenated Amorphous Silicon Based Alloy: a-Si1-xCx:H
5. Kinetics of light induced metastable defect creation in amorphous silicon: A dispersive excitonic model for the weak bond‐dangling bond conversion
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1. Analysis of the physical and photoelectrochemical properties of c-Si(p)/a-SiC:H(p) photocathodes for solar water splitting;Journal of Physics D: Applied Physics;2021-02-23
2. Paramagnetic Defects and Photoluminescence in Carbon Rich a-SiC:H Films: Role of Hydrogen and Excess of Carbon;MRS Proceedings;2007
3. Light-Intensity Dependence of Photocreated Defects in Hydrogenated Amorphous Silicon-Nitrogen Alloy Films;Japanese Journal of Applied Physics;2003-03-01
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