Rapid crystallization of amorphous silicon at room temperature
Author:
Affiliation:
1. a Institute of Physics, Academy of Sciences of the Czech Republic , Cukrovarnická 10, 162 53 Praha 6, Czech Republic
2. b Charles University, Faculty of Mathematics and Physics , Ke Karlovu 3, 121 16 Praha 2, Czech Republic
Publisher
Informa UK Limited
Subject
General Physics and Astronomy,General Chemical Engineering
Link
https://www.tandfonline.com/doi/pdf/10.1080/13642810208222940
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1. Defined crystallization of amorphous-silicon films using contact printing
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3. Formation and structure of epitaxial NiSi2 and CoSi2
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5. Optoelectronic properties of polycrystalline silicon produced by low-temperature (600°C) solid-phase crystallization of hydrogenated amorphous silicon
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