Design of a sampling strategy for measuring and compensating for overlay errors in semiconductor manufacturing-Reference-Cited by-同舟云学术

Design of a sampling strategy for measuring and compensating for overlay errors in semiconductor manufacturing

Published:2003-01 Issue:11 Volume:41 Page:2547-2561
ISSN:0020-7543
Container-title:International Journal of Production Research
language:en
Short-container-title:International Journal of Production Research

Author:

Chien C.-F.¹,Chang K.-H.¹,Chen C.-P.²

Affiliation:

1. a Department of Industrial Engineering & Engineering Management , National Tsing Hua University , 101 Section 2 Kuang Fu Road, Hsinchu, Taiwan, 30043, ROC

2. b Macronix International Co., Ltd , Hsinchu, Taiwan, 30077, ROC

Publisher

Informa UK Limited

Subject

Industrial and Manufacturing Engineering,Management Science and Operations Research,Strategy and Management

Link

https://www.tandfonline.com/doi/pdf/10.1080/0020754031000087256

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bayesian decision analysis for optimizing in-line metrology and defect inspection strategy for sustainable semiconductor manufacturing and an empirical study;Computers & Industrial Engineering;2023-08

2. Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement;Photonics;2023-02-04

3. Robust control of maximum photolithography overlay error in a pattern layer;CIRP Annals;2023

4. Review of overlay error and controlling methods in alignment system for advanced lithography;Thirteenth International Conference on Information Optics and Photonics (CIOP 2022);2022-12-15

5. Dynamic Down-Selection of Measurement Markers for Optimized Robust Control of Overlay Errors in Photolithography Processes;IEEE Transactions on Semiconductor Manufacturing;2022-05