10.3131/jvsj2.51.382-Reference-Cited by-同舟云学术

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10.3131/jvsj2.51.382

Published:2008 Issue:6 Volume:51 Page:382-385
ISSN:1882-4749
Container-title:Journal of the Vacuum Society of Japan
language:
Short-container-title:J. Vac. Soc. Jpn.

Author:

OHTSUKA Tetsuro,MIYAMURA Amica,SATO Yasushi,SHIGESATO Yuzo,YAGI Takashi,TAKETOSHI Naoyuki,BABA Tetsuya

Publisher

The Vacuum Society of Japan

Subject

Spectroscopy,Surfaces and Interfaces,Instrumentation,General Materials Science

Reference15 articles.

1. Influence of substrate bias on the composition, structure and electrical properties of reactively d.c.-sputtered TiN films

2. TiN formed by evaporation as a diffusion barrier between Al and Si

3. Reactive ion plating (RIP) with auxiliary discharge and the influence of the deposition conditions on the formation and properties of TiN films

4. Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering

5. 5) T. Baba: Progress in Heat Transfer, new series, Vol. 3 (Yokendo, Tokyo, 2000).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of Ultrafast Laser Flash Methods for Measuring Thermophysical Properties of Thin Films and Boundary Thermal Resistances;Japanese Journal of Applied Physics;2011-11-21

2. Development of Ultrafast Laser Flash Methods for Measuring Thermophysical Properties of Thin Films and Boundary Thermal Resistances;Japanese Journal of Applied Physics;2011-11-01

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