1. 1) C. J. Powell and R. Shimizu: Surf. Interface Anal., 25 (1997) 860.
2. 2) International Standard ISO 18114 Surface chemical analysis-Secondary ion mass spectrometry-Determining relative sensitivity factors from ion-implanted reference materials (International Organization for standardization, Geneva, 2003).
3. 3) D. S. Simons: Secondary Ion Mass Spectrometry SIMS IX, ed. by A. Benninghoven, Y. Nihei, R. Shimizu and H. W. Werner (Wiley, Chichester, 1994) p. 140.
4. 4) International Standard ISO 14237 Surface chemical analysis-Secondary ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials (International Organization for standardization, Geneva, 2000).
5. 5) S. Hayashi, H. Yonezawa, Y. Homma, F. Tohjou, Y. Yoshioka, K. Okuno, Y. Okamoto, T. Maruo, N. Gennai, N. Tsuda, A. Yamamoto and K. Tsunoyama: Secondary Ion Mass Spectrometry SIMS X, ed. by A. Benninghoven, B. Hagenhoff and H. W. Werner (Wiley, Chichester, 1997), p. 661.