1. Overlay performance of 180 nm ground rule generation x-ray lithography aligner;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11
2. Mask Distortion Analysis for the Fabrication of 1 GBit Dynamic Random Access Memories by X-Ray Lithography;Japanese Journal of Applied Physics;1993-12-30
3. Mechanical Response of X-Ray Masks;Japanese Journal of Applied Physics;1993-12-30
4. Practical considerations in x-ray mask mounting methodology;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
5. Deformation of x-ray lithography masks during tool chucking;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11