Deformation of x-ray lithography masks during tool chucking
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Published:1992-11
Issue:6
Volume:10
Page:3208
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
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1. Pattern placement errors in mask membranes;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11
2. Practical considerations in x-ray mask mounting methodology;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
3. First x-ray stepper in IBM advanced lithography facility;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11