Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma-Reference-Cited by-同舟云学术

Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma

Published:2017-01 Issue:1 Volume:35 Page:01B130
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sharma Akhil¹,Longo Valentino²,Verheijen Marcel A.³,Bol Ageeth A.¹,Kessels W. M. M. (Erwin)¹

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. ams AG, Tobelbader Strasse 30, A-8141 Premstaetten, Austria

3. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands and Philips Innovation Services, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4972210

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