A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources-Reference-Cited by-同舟云学术

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A simulation model for thickness profile of the film deposited using planar circular type magnetron sputtering sources

Published:1996-09 Issue:5 Volume:14 Page:2721-2727
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Hong Seungbum,Kim Eunah,Bae Byeong‐Soo,No Kwangsoo,Lim Sung‐Chul,Woo Sang‐Gyun,Koh Young‐Bum

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580193

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review and future perspective of feature scale profile modeling for high-performance semiconductor devices;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-22

2. Correction mask for large-area anti-reflection coatings deposited using a plasma-assisted reactive magnetron sputtering;Optical Interference Coatings Conference (OIC) 2022;2022

3. Curved-boundary particle-in-cell simulation for the investigation of the target erosion effect of DC magnetron sputtering system;AIP Advances;2020-12-01

4. Thickness distribution of sputtered films on curved substrates for adjustable x-ray optics;Journal of Astronomical Telescopes, Instruments, and Systems;2019-03-23

5. Magnetic thin film deposition with pulsed magnetron sputtering: deposition rate and film thickness distribution;IOP Conference Series: Materials Science and Engineering;2016-02

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