Curved-boundary particle-in-cell simulation for the investigation of the target erosion effect of DC magnetron sputtering system
Author:
Affiliation:
1. Department of Electrical Engineering, Pusan National University, Busan 46241, South Korea
2. Mechatronics R&D Center, Samsung Electronics Company, Ltd., Suwon 16677, South Korea
Funder
Brain Korea 21 Four
National Research Council of Science and Technology
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0035172
Reference26 articles.
1. The effect of negative ions from the target on thin film deposition in a direct current magnetron sputtering system
2. Numerical Analysis of the Incident ion Energy and Angle Distribution in the DC Magnetron Sputtering for the Variation of Gas Pressure
3. A new empirical formula for the sputtering yield
4. New fit formulae for the sputtering yield
5. The use of the ghost fluid method for Poisson's equation to simulate streamer propagation in point-to-plane and point-to-point geometries
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2. Experimental evidence of various mode numbers of azimuthal waves in an E×B Penning source for semiconductor processing;Plasma Sources Science and Technology;2023-07-01
3. Particle-in-Cell Simulations for the Improvement of the Target Erosion Uniformity by the Permanent Magnet Configuration of DC Magnetron Sputtering Systems;Coatings;2023-04-07
4. Two-dimensional particle-in-cell simulation of electron heating effect in multiple hollow cathode trenches with curved boundary;Frontiers in Physics;2023-03-23
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