Author:
Peters Andrew J.,Lawson Richard A.,Ludovice Peter J.,Henderson Clifford L.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
19 articles.
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1. Three-dimensional line edge roughness in pre- and post-dry etch line and space patterns of block copolymer lithography;Physical Chemistry Chemical Physics;2020
2. Chemoepitaxial guiding underlayers for density asymmetric and energetically asymmetric diblock copolymers;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-11-22
3. Block copolymer directed self-assembly using chemoepitaxial guiding underlayers with topography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11
4. Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-10-27
5. Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-10-20