Chemically enhanced focused ion beam micromachining of copper-Reference-Cited by-同舟云学术

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Chemically enhanced focused ion beam micromachining of copper

Published:2001 Issue:6 Volume:19 Page:2539
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Gonzalez J. C.,Griffis D. P.,Miau T. T.,Russell P. E.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Voids in Kesterites and the Influence of Lamellae Preparation by Focused Ion Beam for Transmission Electron Microscopy Analyses;IEEE Journal of Photovoltaics;2019-03

2. The radiation chemistry of focused electron-beam induced etching of copper in liquids;Nanoscale;2019

3. Tightly adhering diamond-like carbon films on copper substrates by oxygen pre-implantation;Surface and Coatings Technology;2018-02

4. Electron Beam Etching of CaO Crystals Observed Atom by Atom;Nano Letters;2017-07-26

5. Focused electron beam induced etching of copper in sulfuric acid solutions;Nanotechnology;2015-11-16

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