High resolution x-ray mask repair
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Published:1995-11
Issue:6
Volume:13
Page:3070
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Blauner Patricia G.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
4 articles.
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1. Masks for X-ray Lithography;Encyclopedia of Materials: Science and Technology;2001
2. A review of ion projection lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05
3. Internal Stress and Microstructure ofWNxBilayer Films for X-Ray Masks;Japanese Journal of Applied Physics;1997-12-30
4. Method for fabricating a low stress x-ray mask using annealable amorphous refractory compounds;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11