Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography
Author:
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Surface Micro‐ and Nanoengineering: Applications of Layer‐by‐Layer Technology as a Versatile Tool to Control Cellular Behavior;Small;2019-06-07
2. Preparation of GaN Nanorods by Rare Earth Metal Tb Catalyst-Assisted Process;Rare Metal Materials and Engineering;2012-11
3. Smoothing of substrate pits using ion beam deposition for EUV lithography;SPIE Proceedings;2012-03-29
4. Semiconductor crystal islands for three-dimensional integration;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
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