Roughness study of a positive tone high performance SCALPEL resist-Reference-Cited by-同舟云学术

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Roughness study of a positive tone high performance SCALPEL resist

Published:2000 Issue:6 Volume:18 Page:3435
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ocola L. E.,Orphanos P. A.,Li W.-Y.,Waskiewicz W.,Novembre A. E.,Sato M.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning;Nanofabrication;2011-10-04

2. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-01

3. Stochastic modeling and simulation of photoresist surface and line-edge roughness evolution;European Polymer Journal;2010-10

4. Study on line edge roughness for electron beam acceleration voltages from 50 to 5 kV;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2009

5. A review of line edge roughness and surface nanotexture resulting from patterning processes;Microelectronic Engineering;2006-04

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