Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks-Reference-Cited by-同舟云学术

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Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks

Published:2021-07 Issue:4 Volume:39 Page:043201
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Zoubenko Ekaterina¹^ORCID,Iacopetti Sara¹,Weinfeld Kamira²,Kauffmann Yaron¹,Van Cleemput Patrick³,Eizenberg Moshe¹²

Affiliation:

1. Department of Materials Science and Engineering, Technion—Israel Institute of Technology, Haifa 32000, Israel

2. Solid State Institute, Technion—Israel Institute of Technology, Haifa 32000, Israel

3. Lam Research Corporation, Fremont, California 94538

Funder

Lam Research

Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000964

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nondispersive Ultraviolet Visible Gas Analyzer for Monitoring Molybdenum Chloride and Oxychloride Precursors During Vapor Deposition Processes;Applied Spectroscopy;2024-08-12

2. Evaluation of vapor pressure of MoO2Cl2 and its initial chemical reaction on a SiO2 surface by ab initio thermodynamics;Current Applied Physics;2024-05

3. Electrical behavior of ALD-molybdenum films in the thin-film limit;2024 IEEE 36th International Conference on Microelectronic Test Structures (ICMTS);2024-04-15

4. Low-resistivity molybdenum obtained by atomic layer deposition;Journal of Vacuum Science & Technology A;2023-08-28

5. Study on the Deposition Characteristics of Molybdenum Thin Films Deposited by the Thermal Atomic Layer Deposition Method Using MoO2Cl2 as a Precursor;Coatings;2023-06-09

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