Author:
Ehrke H.-U.,Loibl N.,Moret M. P.,Horréard F.,Choi J.,Hombourger C.,Paret V.,Benbalagh R.,Morel N.,Schuhmacher M.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
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1. Correlative Analysis in the Semiconductor Industry;Microscopy and Microanalysis;2019-08
2. Nonlinearities in depth profiling nanometer layers;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
3. Current literature in mass spectrometry;Journal of Mass Spectrometry;2010-08