Secondary ion mass spectrometry study of silicon surface preparation and the polystyrene/silicon interface-Reference-Cited by-同舟云学术

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Secondary ion mass spectrometry study of silicon surface preparation and the polystyrene/silicon interface

Published:1997-05 Issue:3 Volume:15 Page:894-898
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Strzhemechny Y. M.,Schwarz S. A.,Schachter J.,Rafailovich M. H.,Sokolov J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580728

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Impact of nanoparticle size and shape on selective surface segregation in polymer nanocomposites;Polymer;2012-10

3. TOF-SIMS depth profiling of deuterated polystyrene-block-poly(n -propyl methacrylate) diblock copolymer films;Surface and Interface Analysis;2010-02-05

4. Cluster secondary ion mass spectrometry of polymers and related materials;Mass Spectrometry Reviews;2009-05-15

5. Secondary ion mass spectrometry depth profiling of amorphous polymer multilayers using O2+ and Cs+ ion bombardment with a magnetic sector instrument;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-03

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