Time dependent analysis of the resist deformation in thermal nanoimprint-Reference-Cited by-同舟云学术

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Time dependent analysis of the resist deformation in thermal nanoimprint

Published:2007 Issue:6 Volume:25 Page:2341
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Hirai Yoshihiko,Onishi Yuki,Tanabe Toshiaki,Nishihata Masayoshi,Iwasaki Takuya,Kawata Hiroaki,Iriye Yasuroh

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of process parameters on filling behavior of PMMA in hot embossing;Microsystem Technologies;2024-04-01

2. Bioinspired antireflective flexible films with optimized mechanical resistance fabricated by roll to roll thermal nanoimprint;Scientific Reports;2021-01-28

3. A novel bonding method for fabrication of PMMA nanofluidic chip with low deformation of the nano-trenches;Microfluidics and Nanofluidics;2018-08-24

4. Study on induced strain in direct nanoimprint lithography;Japanese Journal of Applied Physics;2018-05-14

5. High Aspect Ratio Nanoimprint Mold-Cavity Filling and Stress Simulation Based on Finite-Element Analysis;Micromachines;2017-08-06

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