Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant-Reference-Cited by-同舟云学术

Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant

Published:2020-07 Issue:4 Volume:38 Page:043406
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Pliatsikas Nikolaos¹^ORCID,Jamnig Andreas¹²^ORCID,Konpan Martin¹,Delimitis Andreas³^ORCID,Abadias Gregory²^ORCID,Sarakinos Kostas¹^ORCID

Affiliation:

1. Nanoscale Engineering Division, Department of Physics, Chemistry and Biology, Linköping University, Linköping SE 581 83, Sweden

2. Institut Pprime, Département Physique et Mécanique des Matériaux, UPR 3346 CNRS, Université de Poitiers, SP2MI, 11 Bvd M. et P. Curie, F86073 Poitiers Cedex 9, France

3. Department of Mechanical and Structural Engineering and Materials Science, University of Stavanger, N-4036 Stavanger, Norway

Funder

Linköping University

University of Poitiers

Åforsk foundation

Vetenskapsrådet

Stiftelsen Olle Engkvist Byggmästare

Wenner-Gren Stiftelserna

European Consortium of Innovative Universities

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000244

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Does N2 gas behave as a surfactant during Ag thin-film sputtering deposition? Insights from in vacuo and real-time measurements;Applied Surface Science;2024-05

2. Unravelling the effect of nitrogen on the morphological evolution of thin silver films on weakly-interacting substrates;Applied Surface Science;2024-03

3. Design of Ultra-High Density Archival Storage Memory with Nanoprobe and Patterned Oxygenated Amorphous Carbon with Metal Nanoclusters;Journal of Nanoelectronics and Optoelectronics;2024-01-01

4. Understanding the role of engineered cluster evolution in enhancing Ag layer growth on oxides;Applied Surface Science;2024-01

5. On the O₂ “Surfactant” Effect during Ag/SiO₂ Magnetron Sputtering Deposition: The Point of View of In Situ and Real-Time Measurements;ACS Applied Materials & Interfaces;2023-07-22