Does N2 gas behave as a surfactant during Ag thin-film sputtering deposition? Insights from in vacuo and real-time measurements
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Published:2024-05
Issue:
Volume:654
Page:159546
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ISSN:0169-4332
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Container-title:Applied Surface Science
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language:en
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Short-container-title:Applied Surface Science
Author:
Zapata RamiroORCID,
Balestrieri MatteoORCID,
Gozhyk Iryna,
Montigaud Hervé,
Lazzari RémiORCID