Role of cerium dioxide in a tantalum diffusion barrier film for a Cu/Ta+CeO[sub 2]/Si structure
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Cantilever resonator based on the electrostriction effect in Gd-doped ceria;Sensors and Actuators A: Physical;2013-10
2. Atomic Layer Deposited Ultrathin HfO[sub 2] and Al[sub 2]O[sub 3] Films as Diffusion Barriers in Copper Interconnects;Electrochemical and Solid-State Letters;2007
3. Methods for processing tantalum films of controlled microstructures and properties;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-09
4. Reliability of multistacked tantalum-based structure as the barrier film in ultralarge-scale integrated metallization;Microelectronic Engineering;2005-07
5. Interfacial reactions and electrical properties of hafnium-based thin films in Cu/barrier/n+–p junction diodes;Microelectronic Engineering;2005-02
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