Author:
Fritze M.,Palmateer S.,Maki P.,Knecht J.,Chen C. K.,Astolfi D.,Cann S.,Denault S.,Krohn K.,Wyatt P.W.
Cited by
2 articles.
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1. Pattern Generation;Copper Interconnect Technology;2009
2. Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001