Ultrahigh vacuum chemically assisted ion beam etching system with a three grid ion source-Reference-Cited by-同舟云学术

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Ultrahigh vacuum chemically assisted ion beam etching system with a three grid ion source

Published:1997-05 Issue:3 Volume:15 Page:616-621
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Hryniewicz John V.,Chen Y. J.,Hsu Shih Hsiang,Lee Chau-Han D.,Porkolab Gyorgy A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580693

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Vacuum Compatibility of 3-D-Printed Parts;IEEE Transactions on Plasma Science;2016-05

2. Investigation of electrochemical etch differences in AlGaAs heterostructures using Cl2 ion beam assisted etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-03

3. Reflectively Coupled Waveguide Photodetector for High Speed Optical Interconnection;Sensors;2010-12-02

4. Waveguide coupled photodiode using reflector and metal coplanar waveguide for optical triplexing applications;Optics Express;2010-04-19

5. Influence of chlorine on etched sidewalls in chemically assisted ion beam etching with SU-8 as mask;Optical Engineering;2005-06-01

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