Wet and dry etching characteristics of Al0.5In0.5P
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fast-response symmetric coplanar Ni/AlGaInP/Ni visible photodetector;Sensors and Actuators A: Physical;2020-04
2. Crystallographic dependence of the lateral undercut wet etch rate of Al0.5In0.5P in diluted HCl for III–V sacrificial release;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01
3. High-Efficiency III-V Multijunction Solar Cells;Handbook of Photovoltaic Science and Engineering;2011-03-01
4. MEMS Wet-Etch Processes and Procedures;MEMS Reference Shelf;2011
5. Study of Wet Chemical Etching of Al[sub x]Ga[sub 1−x]InP[sub 2] Films Using Hydrochloric Acid;Journal of The Electrochemical Society;2006
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