Scattering with angular limitation projection electron beam lithography for suboptical lithography-Reference-Cited by-同舟云学术

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Scattering with angular limitation projection electron beam lithography for suboptical lithography

Published:1997-11 Issue:6 Volume:15 Page:2130
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Harriott Lloyd R.

Publisher

American Vacuum Society

Subject

General Engineering

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