Investigation of low temperature SiO2 plasma enhanced chemical vapor deposition
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Published:1996-03-01
Issue:2
Volume:14
Page:738
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Author:
Deshmukh Shashank C.
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
62 articles.
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