Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering-Reference-Cited by-同舟云学术

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Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering

Published:2002-05 Issue:3 Volume:20 Page:678-682
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Guruvenket S.,Mohan Rao G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1460888

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of TiN metal hard masks via very-high-frequency-direct-current superimposed sputtering;Materials Science in Semiconductor Processing;2024-12

2. Mechanical and tribological properties related on the texture of TiN films regulated via HiPIMS;Chemical Physics Letters;2023-10

3. Development and Evaluation of Copper Based Transparent Heat Reflectors Obtained by Magnetron Sputtering;Nanomaterials;2022-10-10

4. Mechanical properties of TiN deposited in synchronous bias mode through high-power impulse magnetron sputtering;Surface and Coatings Technology;2022-03

5. Comparative Study of Tribological Behavior of TiN Hard Coatings Deposited by Various PVD Deposition Techniques;Coatings;2022-02-22

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