Fundamental beam studies of radical enhanced atomic layer deposition of TiN-Reference-Cited by-同舟云学术

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Fundamental beam studies of radical enhanced atomic layer deposition of TiN

Published:2003-01 Issue:1 Volume:21 Page:96-105
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Greer Frank,Fraser D.,Coburn J. W.,Graves David B.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1524145

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of spatial distribution of EEPFs and neutral species in nitrogen inductively coupled plasmas by 2D hybrid simulation;Physics of Plasmas;2023-09-01

2. Changing pattern of N₂ dissociation in N₂–Ar RF plasma during E–H mode transition;Plasma Sources Science and Technology;2023-08-01

3. Tailoring the growth and electronic structures of organic molecular thin films;Journal of Physics: Condensed Matter;2019-09-27

4. The effect of disordered substrate on crystallization in 2D;Journal of Physics: Condensed Matter;2019-08-07

5. Conformality in atomic layer deposition: Current status overview of analysis and modelling;Applied Physics Reviews;2019-06

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