Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors
Author:
Affiliation:
1. Department of Chemistry, University of Helsinki, A.I. Virtasen aukio 1, FI-00560 Helsinki, Finland
2. Department of Physics, University of Helsinki, Pietari Kalmin katu 2, FI-00560 Helsinki, Finland
Funder
Semiconductor Research Corporation
Finnish Centre of Excellence in Atomic Layer Deposition
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5124100
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