Stable low-stress tungsten absorber technology for sub-half-micron x-ray lithography-Reference-Cited by-同舟云学术

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Stable low-stress tungsten absorber technology for sub-half-micron x-ray lithography

Published:1991-11 Issue:6 Volume:9 Page:3301
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kola R. R.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 36 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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