Thin‐film deposition using low‐energy ion beams (2) Bb+ ion‐beam deposition and analysis of deposits-Reference-Cited by-同舟云学术

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Thin‐film deposition using low‐energy ion beams (2) Bb+ ion‐beam deposition and analysis of deposits

Published:1977-05 Issue:3 Volume:14 Page:831-835
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Amano J.,Lawson R. P. W.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.569280

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Materials processing using radio-frequency ion-sources: Ion-beam sputter-deposition and surface treatment;Review of Scientific Instruments;2019-02

2. Cluster–surface collisions by phase-space compressed guided-ion beam methods;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-08

3. Ion-energy effects in silicon ion-beam epitaxy;Physical Review B;1996-04-15

4. Peculiarities of nucleation of PbOx thin films during ion-beam reactive sputtering;Physica Status Solidi (a);1996-02-16

5. References;Thin Films by Chemical Vapour Deposition;1990

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