Metal–insulator–metal capacitors using Y[sub 2]O[sub 3] dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition-Reference-Cited by-同舟云学术

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Metal–insulator–metal capacitors using Y[sub 2]O[sub 3] dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition

Published:2004 Issue:3 Volume:22 Page:655
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Durand C.,Vallée C.,Loup V.,Salicio O.,Dubourdieu C.,Blonkowski S.,Bonvalot M.,Holliger P.,Joubert O.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Time-Resolved Analysis of the Electron Temperature in RF Magnetron Discharges with a Pulsed Gas Injection;Atoms;2022-12-06

2. Coke-resistant Y2O3-promoted cobalt supported on mesoporous alumina for enhanced hydrogen production;Journal of the Energy Institute;2021-02

3. Thermal and Plasma-Enhanced Atomic Layer Deposition of Yttrium Oxide Films and the Properties of Water Wettability;ACS Applied Materials & Interfaces;2019-12-20

4. Review—Beyond the Highs and Lows: A Perspective on the Future of Dielectrics Research for Nanoelectronic Devices;ECS Journal of Solid State Science and Technology;2019

5. Charging mechanisms in Y2O3 dielectric films for MEMS capacitive switches;Microelectronics Reliability;2018-09

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