Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography
Author:
Affiliation:
1. Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07
2. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016
3. Negative-tone organic molecular resists;Materials and Processes for Next Generation Lithography;2016
4. Resist Materials and Processes for Extreme Ultraviolet Lithography;Japanese Journal of Applied Physics;2013-01-01
5. Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
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