The effect of acceleration voltage on linewidth control with a variable-shaped electron beam system-Reference-Cited by-同舟云学术

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The effect of acceleration voltage on linewidth control with a variable-shaped electron beam system

Published:1987-01 Issue:1 Volume:5 Page:105
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Murai Fumio

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Thermal analysis of projection electron beam lithography using complementary mask exposures;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

3. Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

4. SPL Linewidth Control;Microsystems;2001

5. Electron beam and scanning probe lithography: A comparison;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-11

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