1. International Technology Roadmap for Semiconductors (San Jose: Semiconductor Industry Association, 1997). Data also reflects 1998 update to the roadmap.
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4. M. Hatzakis, “Fundamental aspects of electron beam exposure of polymer resists systems,” J. Electrochem. Soc. 121, 106C (1974).
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1 ( Bellingham, Wash: SPIE Optical Engineering Press, 1997 ).