Direct patterning of nanometer-scale silicide structures by focused ion-beam implantation through a thin barrier layer

Author:

Mitan M. M.,Pivin D. P.,Alford T. L.,Mayer J. W.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Xenon-ion irradiation of Co/Si bilayers: Magnetic and structural properties;Applied Surface Science;2018-07

2. Xenon-ion-induced and thermal mixing of Co/Si bilayers and their interplay;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2011-05

3. Ion beam induced surface and interface engineering;Surface Science Reports;2011-03

4. Xenon-ion irradiation of Co/Si bilayers: Effects of interface structure and ion energy;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2008-05

5. Formation of cobalt silicide from filter metal vacuum arc deposited films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-06

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