Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors
Author:
Affiliation:
1. Tyndall National Institute, University College Cork, Cork T12 R5CP, Ireland
2. Lam Research Corporation, Portland, Oregon 97062
Funder
Lam Research Corporation (Lam Research)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4964890
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