Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation-Reference-Cited by-同舟云学术

Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation

Published:2020-07 Issue:4 Volume:38 Page:043006
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Kateb Movaffaq¹²^ORCID,Gudmundsson Jon Tomas¹³^ORCID,Ingvarsson Snorri¹^ORCID

Affiliation:

1. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland

2. School of Science and Engineering, Reykjavik University, Menntavegur 1, IS-102 Reykjavik, Iceland

3. Department of Space and Plasma Physics, School of Electrical Engineering and Computer Science, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden

Funder

University of Iceland Research Fund

Icelandic Centre for Research

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000233

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural and tribomechanical properties of Cr-DLC films deposited by reactive high power impulse magnetron sputtering;Vacuum;2024-12

2. Simulation Study of Crystalline Al2O3 Thin Films Prepared at Low Temperatures: Effect of Deposition Temperature and Biasing Voltage;Metals;2024-07-29

3. Nanovoid formation mechanism in nanotwinned Cu;Discover Nano;2024-03-12

4. Low-pressure high-current pulsed magnetron discharge with electron injection from a vacuum arc plasma emitter;Vacuum;2024-01

5. Fabrication of high aspect-ratio metallic nanotube array with highly-ordered periodicity using HiPIMS;Journal of Alloys and Compounds;2023-10