Author:
Sant S. P.,Nelson C. T.,Overzet L. J.,Goeckner M. J.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
8 articles.
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1. Formation of a SiOF reaction intermixing layer on SiO2 etching using C4F6/O2/Ar plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-07
2. Kinetics of the deposition step in time multiplexed deep silicon etches;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01
3. Ion contributions to gas–surface interactions in inductively-coupled fluorocarbon plasmas;International Journal of Mass Spectrometry;2012-12
4. Gain and loss mechanisms for neutral species in low pressure fluorocarbon plasmas by infrared spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-09
5. Role of surface temperature in fluorocarbon plasma-surface interactions;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-07