Hollow cathode sputtering cluster source for low energy deposition: Deposition of Fe small clusters-Reference-Cited by-同舟云学术

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Hollow cathode sputtering cluster source for low energy deposition: Deposition of Fe small clusters

Published:1999-01 Issue:1 Volume:17 Page:310-313
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ishii K.,Amano K.,Hamakake H.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581585

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4. Morphological control of nanostructured Ge films in high Ar-gas-pressure plasma sputtering process for Li ion batteries;Japanese Journal of Applied Physics;2021-12-15

5. Probe measurements of a plasma hollow cathode discharge used as a sputter source for copper thin film;Journal of Optics;2021-07-01

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