Novel germanium surface modification for sub-10 nm patterning with electron beam lithography and hydrogen silsesquioxane resist
Author:
Affiliation:
1. Materials Chemistry and Analysis Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland and AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland
Funder
Science Foundation Ireland (SFI)
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4948916
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