Novel germanium surface modification for sub-10 nm patterning with electron beam lithography and hydrogen silsesquioxane resist-Reference-Cited by-同舟云学术

Novel germanium surface modification for sub-10 nm patterning with electron beam lithography and hydrogen silsesquioxane resist

Published:2016-07 Issue:4 Volume:34 Page:041603
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Gangnaik Anushka S.¹,Georgiev Yordan M.¹,Collins Gillian¹,Holmes Justin D.¹

Affiliation:

1. Materials Chemistry and Analysis Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland and AMBER@CRANN, Trinity College Dublin, Dublin 2, Ireland

Funder

Science Foundation Ireland (SFI)

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4948916

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