Transparent polycrystalline monoclinic HfO2 dielectrics prepared by plasma assisted pulsed laser deposition-Reference-Cited by-同舟云学术

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Transparent polycrystalline monoclinic HfO2 dielectrics prepared by plasma assisted pulsed laser deposition

Published:2012-01 Issue:1 Volume:30 Page:011506
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ying Zhifeng,Sun Jian,Hu Zhigao,Yu Wenlei,Xu Ning,Wu Jiada

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3673783

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale-Thick Thin Films of High-Density HfO2 for Bulk-like Optical Responses;ACS Applied Nano Materials;2021-09-30

2. Hf-Based High-κ Dielectrics: A Review;Acta Physica Polonica A;2019-12

3. Reactively sputtered hafnium oxide on silicon dioxide: Structural and electrical properties;Solid-State Electronics;2015-04

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