Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.582343
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Real time feedback control of plasma density using a floating probe in semiconductor processing;Current Applied Physics;2013-01
2. A transmission-line microwave interferometer for plasma electron density measurement;Plasma Sources Science and Technology;2006-11-21
3. Oxide etch rate estimation using plasma impedance monitoring;SPIE Proceedings;2005-05-17
4. Sensor fault detection in etch based on broadband rf signal observation;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-05
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