Very high voltage (500 kV) electron beam lithography for thick resists and high resolution-Reference-Cited by-同舟云学术

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Very high voltage (500 kV) electron beam lithography for thick resists and high resolution

Published:1987-01 Issue:1 Volume:5 Page:120
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Jones G. A. C.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomically precise digital e-beam lithography;Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020;2020-03-23

2. Electron Beam Lithography of Nanostructures;Reference Module in Materials Science and Materials Engineering;2016

3. Electron Beam Lithography (EBL);Encyclopedia of Nanotechnology;2016

4. Electron Beam Lithography of Nanostructures;Comprehensive Nanoscience and Technology;2011

5. Radiation Chemistry in Chemically Amplified Resists;Japanese Journal of Applied Physics;2010-03-23

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