Multiaxis and multibeam technology for high throughput maskless E-beam lithography-Reference-Cited by-同舟云学术

Multiaxis and multibeam technology for high throughput maskless E-beam lithography

Published:2012-11 Issue:6 Volume:30 Page:06FC01
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Yasuda Hiroshi,Haraguchi Takeshi,Yabara Hidebumi,Takahata Kouji,Murata Hidekazu,Rokuta Eiji,Shimoyama Hiroshi

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4767275

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