Author:
Liu Chun-Hung,Chang Chia-Hua,Lo Wen,Chang Shih-Ming,Wu Hsin-Wei,Chen Chien-Cheng,Chen Alex,Chou Shuo-Yen,Liu Ru-Gun
Reference7 articles.
1. Evaluation of Shot Position Error in Electron Beam Lithography Using Overlay Metrology with 'One-Shot' Inspection Mark;Koji,1998
2. Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device
3. The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy
4. Requirements of the e-beam shot quality for mask patterning of the sub-1X device;Park,2016
5. Nanofabrication : principles, capabilities and limits;Cui,2017
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献