Accumulated sidewall damage in dry etched photonic crystals
Author:
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. (Invited) Challenges for Etch Technology and the Integration of New Channel Materials Beyond 7 nm;ECS Transactions;2017-04-27
2. Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour;Microelectronics Reliability;2015-08
3. Electrically Pumped Photonic Crystal Lasers: Laser Diodes and Quantum Cascade Lasers;Compact Semiconductor Lasers;2014-04-25
4. Novel postetch process to realize high quality photonic crystals in InP;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-05
5. Heterogeneous integration and precise alignment of InP-based photonic crystal lasers to complementary metal-oxide semiconductor fabricated silicon-on-insulator wire waveguides;Journal of Applied Physics;2010-03-15
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