Diffraction effects in x-ray proximity printing
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Unified rule based correction for corners in proximity lithography mask using high resolution features;Microelectronic Engineering;2017-03
2. Analysis of irradiance distribution in optical proximity printing of micro annulus apertures;Japanese Journal of Applied Physics;2014-05-21
3. Mechanical nanostepping for atom beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007
4. Printability of sub-150 nm features in x-ray lithography: Theory and experiments;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
5. Diffraction effects and image blurring in x-ray proximity printing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11
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