Hydrogenated-amorphous carbon nitride films formed from the dissociative excitation reaction of CH[sub 3]CN with the microwave-discharge flow of Ar: Correlation of the [N]/([N]+[C]) ratio with the relative number densities of the CH(A[sup 2]Δ) and CN(B[sup 2]Σ[sup +]) states-Reference-Cited by-同舟云学术

Hydrogenated-amorphous carbon nitride films formed from the dissociative excitation reaction of CH[sub 3]CN with the microwave-discharge flow of Ar: Correlation of the [N]/([N]+[C]) ratio with the relative number densities of the CH(A[sup 2]Δ) and CN(B[sup 2]Σ[sup +]) states

Published:2004 Issue:3 Volume:22 Page:487
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Ito Haruhiko,Miki Hiroshi,Namiki Kei-ichi C.,Ito Noriko,Saitoh Hidetoshi,Suzuki Tsuneo,Yatsui Kiyoshi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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1. Structural analysis of hydrogenated amorphous carbon nitride films formed from the decomposition of CH3CN in the microwave discharge flow of Ar;Japanese Journal of Applied Physics;2019-05-17

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3. Production of CH(A2Δ) radicals from the dissociative excitation reaction of C2H2with microwave discharge flow of Ar;Japanese Journal of Applied Physics;2015-05-29

4. Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar;Plasma Chemistry and Plasma Processing;2014-02-12

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